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Dr. Lionel Santinacci - CNRS-Marsiglia, Francia - "Atomic Layer Deposition: Technology and Applications", 15-19 April 2019

15 hours (4 credits)

Aula Riunioni del Dipartimento di Ingegneria dell’Informazione, Via G. Caruso 16, Pisa – Ground Floor

Short Abstract:
After a general introduction on nanosciences and nanotechnologies, the principles and new developments of atomic layer deposition (ALD) will be described.
The fundamental aspects as well as practical information will be presented in order to provide the basics to initiate an ALD process in the laboratory. A special attention will be drawn on the in situ and ex situ metrologies that are critical to develop well defined ALD processes. Applications of ALD to different fields will be also discussed, with special emphasis to the energy field. The use of ALD in the energy field will clearly highlight the interest of this tool to improve nanoscale devices.

Course Contents in brief:

  • Introduction to nanoscience and nanotechnologies
  • Atomic Layer Deposition – ALD - context, principle, metrology
  • New developments of ALD
  • ALD and energy applications
  • ALD for solar fuel generation


  • 15/04/2019: 9:30 - 12:30
  • 16/04/2019: 9:30 - 12:30
  • 17/04/2019: 9:30 - 12:30
  • 18/04/2019: 9:30 - 12:30
  • 19/04/2019: 9:30 - 12:30